Plasma Cleaning System
Engineered Plasma Systems for Particle-Sensitive and Thin-Film Applications
Our RPS vacuum plasma cleaning system integrates differential mass spectrometry and thin-film thickness measurement, enabling highly controlled plasma-based surface treatment. This system has recently been delivered to support advanced R&D in material science and thin-film processing — marking another step forward in Rhythm M&E Equipment’s precision vacuum technology capabilities.
🔵 发布时间表
- 202X — RPS plasma concept development
- 202X — Mass spectrometry & film measurement integration
- 202X — Current full-system deployment
🔵 Key Functions
- Surface activation & modification
- Oxide & organic residue removal
- Plasma uniformity control
- Differential mass spectrometry analysis
- In-situ thin-film thickness measurement
🔵 系统配置
- RPS plasma source module
- Gas flow & pressure control subsystem
- Differential mass spectrometry module
- Thin-film optical measurement unit
- Viewport & diagnostic integration ports
🔵 技术亮点
- Stable plasma discharge with high repeatability
- Low-particle plasma cleaning
- High-uniformity treatment area
- Modular design for different chamber sizes
- Fast plasma-response and adjustable power profiles
🔵 清洁装配与验证
All plasma systems are assembled in controlled environments, with full discharge stability testing, leak verification, and calibration procedures to ensure consistent performance in demanding research settings.🔵 Application Fields
- Material surface activation
- Thin-film preparation & cleaning
- Optical component pre-treatment
- Semiconductor & microelectronic R&D
- General vacuum plasma research
Rhythm M&E provides custom-designed aluminum-alloy target chambers for plasma applications, laser–plasma experiments, and material interaction studies. Available in spherical, cylindrical, round, and square geometries, each chamber supports flexible diagnostic integration and stable plasma environments for advanced scientific research.
🔵 Available Chamber Types
- Spherical laser-plasma target chamber
- Cylindrical laser-plasma target chamber
- Round aluminum-alloy chamber
- Square / rectangular aluminum-alloy chamber
🔵 Key Features
- Lightweight aluminum alloy structure
- High machining precision
- Multiple CF / ISO diagnostic ports
- Plasma-resistant interior finish
- Viewport and feedthrough customization
🔵 系统配置
- Aluminum-alloy chamber body
- Custom CF/ISO port distribution
- Optical viewport arrangement
- Internal fixture / target mount options
- Plasma source & diagnostic compatibility
🔵 技术亮点
- High structural rigidity & vacuum stability
- Improved heat dissipation characteristics
- Low-mass design for fast system response
- Smooth interior finish for plasma interactions
- Flexible scaling for multi-port experiments
🔵 Application Fields
- Laser–plasma interaction experiments
- Material research & thin-film studies
- Diagnostics development & testing
- High-energy physics setups
- General plasma experimental platforms